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» Titanium Sputtering Targets (Beschichtungswerkstoffe)
Sputtering is one of the most common and widely used technologies for thin film manufacturing (Dünnschichttechnik). Target materials are available in a variety of grades and purities to meet specific customer requirements. Titanium Sputtering Targets for the glass coating industry.
Purity: 99.5%(2N5) - 99.995%(4N5)
Advance Powder Metallurgy: Hot Isostatic Process
Density: 7.19gm/cm3 based on 99.9% purity
Physical Properties: Isotropic properties, Equiaxed Microstructure and Uniformity on Density(over100 pieces)with Cpk 8.10766
